Call for Applications: Priority Deadline January 14, 2012
Summer Residency: Hartford, CT
Fall Residencies: NYC & San Francisco
Spring Residency: Berlin
For more information: www.hartfordphotomfa.org
About
The international limited-residency MFA in Photography at the Hartford Art School is an innovative program designed for both mature individuals with established experience in the field as well as recent graduates who wish to further their own practice and acquire an MFA degree in order to facilitate their professional credentials as artists and educators.
Q? How does this limited-residency model work?
A: Our approach offers a “blended learning model”—research, independent study, and online critiques—with on-site classroom learning. The program couples intensive on-campus sessions during the summer with travel components in the spring and fall. The summer sessions meet at the University of Hartford for two-weeks, during which time students and faculty interact inside and outside the classroom. The fall and spring sessions meet at off-site locations such as NYC, San Francisco and Berlin for 7–10 days. In the time between classroom sessions students complete course assignments and maintain regular contact with their Thesis Advisor. The total time to the MFA is twenty-five months, of which only ten to twelve weeks are spent away from your studio.
Q? Who are the faculty?
A: The faculty is gathered from the United States and International locations and is augmented by visiting artists, curators, writers and other leading professionals in the field.
